Microfabrication Flashcards

1
Q

What is microfabrication?

A

The process of producing MEMS devices

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2
Q

Where should the process be conducted?

A

In a clean room. Laminar air flow forces particles (smaller than 0.1um) towards the floor where they are filtered using a HEPA filter. Rated from Class 1 (1000 particles per m3) to Class 10,000 (10,000,000 particles). All surfaces are stainless steel, which is non shedding.

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3
Q

What is the starting material?

A

Doped silicon wafer. Either N - Phosphorus or Arsenic with 5 outer shell e- or P - Boron - 3 e-. Creates a semi conductor with a free electron to carry current. Normal silicon has 4 e- and as such has no free electrons

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4
Q

Why/how do we clean the silicon wafer?

A

Particles on the surface (hair, skin, fabric, tweezers etc) can cause defects in deposited materials - clean with DI water (removes electrostatically bound particles) and sonic agitation - dump rinse with DI and dry with N gas

Films on the surface can cause defects and affect adhesion. Remove with 1:3 ratio of H202:H2SO4, DI water and N2 gas

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5
Q

What are the methods of deposition?

A

Thermal oxidation
CVD
PVD

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6
Q

How does thermal oxidation work?

A

Used to deposit SO2 on surface. Uses N2 as carrier gas. Two types;
Dry - slow (0.1um/hour) but pure - gate oxide/pad oxide
Wet - uses water - converted to OH at high temp which passes through oxide layer quicker than O2. Produces thicker layer, not as pure

Operates at high temp, around 1000 degrees (increases reaction rate) and high pressure (increases passage of O2 through oxide layer to silicon)

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7
Q

How does CVD work?

A

Used to deposit Polysilicon and Silicon Nitride

Operates in the vapour phase, deposits materials onto substrate. Increase reaction by increasing temp and pressure

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8
Q

How does PVD work?

A

Used to deposit metals (Au, Al, Pt) and PZ material (PZT) Operates in a vacuum (no particles to interfere) and heat silicon wafer (to increase adhesion)

Two types:
Thermal Evaporation - used for materials with lower melting point. Uses a filament heater to heat metal.
E-beam evaporation - use charged tungsten filament to fire electrons at target anode - converts metal to gaseous atoms - condensate on any solid surface.

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9
Q

What are the benefits of e-beam evaporation over thermal evaporation?

A

Does not use a filament heater - this can provide impurities

Greater control over evaporation of metal

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10
Q

What binding materials do we use for Al and Au

A

Pt and Cr

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11
Q

What is photolithography?

A

Patterning of material

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12
Q

What is a photoresist?

A

Material that we use to produce underlying resist or layer

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13
Q

How do we apply a photoresist?

A

Spin onto wafer

Pre-bake at 80 degrees for 5 mins

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14
Q

What is a photomask?

A

Quartz glass with specific pattern

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15
Q

How do we use UV beams to pattern the surface?

A

UV beam passes through photomask and either increases solubility (positive photoresist - DNQ/Novalac) or decreases solubility (negative photoresist - epoxy based)

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16
Q

What is the diffraction limit of UV light?

A

500nm

17
Q

What is the benefit and negative of E-beam lithography

A
Higher resolution (less than 100nm)
Slower/expensive
18
Q

What is the etch rate determined by?

A

Rate of etchant getting to surface (pressure/stirring)

Reaction of etchant at surface (temp)

19
Q

What is etch rate measured by

A

nm/min

um/min

20
Q

What is etch selectivity?

A

Etch rate of desired layer/Etch rate of underlying layer

21
Q

What is an excellent etch selectivity?

A

Greater than 100

22
Q

What is an ansiotropic etchant?

A

Directionally dependent (R=0)

23
Q

How do we calculate whether an etchant is ansio or iso tropic?

A

Lateral etch rate/vertical etch rate

24
Q

What are the two types of etching?

A

Wet - chemicals - isotropic

Dry - gas beam - ansiotropic

25
Q

How can we etch Silicon?

A

KOH

26
Q

How can etch Silicon Dioxide?

A

HF

27
Q

How can we etch resist?

A

O2