Functional coatings Flashcards
(37 cards)
Why is TiO2 brilliant?
- high refractive index
- high photo catalytic stability in the visible region
- physiological harmlessness (low toxicity)
- resistant to high temperatures
- low reactivity, insoluble in water, organic solvents , alkalis and most inorganic acid
- UV Photoactivity
Hiding power
-Paint property related to how much pigment is required for complete opacity.
Two routes of manufacture of TiO2
- Sulphate process
- Chloride process
-Essentially converts impure TiO2 into another chemical, separate the impurities and then convert back into pure TiO2 .
Sulphate process
- Slags are ground, dried and classified
- Dissolving the titanium rich ore ilmenite(FeTiO3) in hot concentrated sulphuric acid This produces titanylsulphate( TiO(SO4) ). Addition of Fe to ensure Fe2+ not Fe3+ (Fe2+ is more soluble to hydrolysis) –this is comproportionation Fe + Fe3+ -> Fe2+
FeTiO3 + 2H2SO4 -> FeSO4 + TiO(SO4) + 2H2O
- This is then hydrolysed thermally to precipitate titanium oxyhydroxide. Seed crystals are added in order to orientate the crystal formation towards anatase or rutile
TiO(SO4) + (n+1)H2O -> TiO2.nH2O + H2SO4 - Calcination of this yields anatase(800-850°C) or rutile (900-930°C)
TiO2.nH2O -> TiO2 + nH2O
Chloride process
- Carbothermal chlorination
The ore (containing at least 70% TiO2) is mixed with pulverized coke and passed into a chlorinator at elevated temperatures (900 -1700°C) . This produces titanium tetrachloride.
TiO2 + C(s) + 2Cl2 -> TiCl4 + CO2 - The TiCl4 is then purified and passed into an oxygen flame. The chlorine released during oxidation is collected and recycled into the chlorinator.
TiCl4 + O2 -> TiO2 + 2Cl2
Differences between sulphate and chloride processes
- Sulphate is batch, chloride is continuous
- Sulphate uses lower grade staring materials but chloride produces purer products
- Sulphate creates large amounts of waste
- Sulphate lower capital investment
- Sulphate produces anatase and rutile, where as chloride produces on rutile
3 main forms of titanium dioxide
- Anatase
- Rutile
- Brookite
Photoactivity of TiO2
TiO2 + hv –> TiO2 (e- + h+)
Wetting
Ability of a liquid to wet to a smooth surface can be determined by the contact angle
Poor wetting
- Hydrophobic
- Wetting angle of around 150’
Normal wetting
90’
Good wetting
- Hydrophilic
- 10’
Components of paint
Binders –organic macromolecular compounds. Anchor pigments and extenders in the film
Solvents –used to dissolve the natural or synthetic resins used as binders. Influence the flow properties
Pigments –the essential colouring components of the film
Extenders –additions that make formulations more economical. Influence in-service properties
Three approaches for self-cleaning surfaces
- hydrophobic -Cleans by rolling droplets
- hydrophilic - sheeting water carries away dirt
- photocatalytic - UV activated
Photocatalytic surfaces reactions
TiO2 + hv -> TiO2 (e-+ h+)
forms an electron and a hole
Electron -reducing agent, forms perhydroxyl radical with oxygen and water
Hole - oxidizing agent , forms hydroxyl radicals with OH
Electron reaction to form radical
e- + O2 –> •O2-
•O2- + H2O –> OH- + •O2H
Hole reaction to radical
h+ + OH- –> •OH
Water purification reaction
•OH + dye molecule → intermediates → CO2↑ + H2O + mineral salts.
Anti fog
Achieved using a very hydrophilic surface, forms a film over surface
Transparent conducting oxides
- Fluorine dope tin oxide (FTO)
- Indium Tin oxide (ITO)
Manufacture of FTO
- Made via a float line using chemical vapour deposition
- Precursors in vapour form are decomposed into atoms or molecules
- React with each other at the hot substrate surface to form non-volatile product coating
- Decomp triggered by high temp, plasma or light
- Does not need a vacuum
- SnCl4+ 2(H2O) -> SnO2 +4(HCl)
- Desorption of volatile surface products
- Barrier layer (SiO2) deposited before SnO2 to stop diffusion of ions from soda lime glass into coating which would disrupt electrical properties
Manufacture of ITO
-Made via physical vapour deposition (sputtering)
-System consists of vacuum, cathode assembly including target material for sputtering, working gas (Ar) at low pressure and substrate to be coated
• Establishment of a glow discharge gas in the gas to create Ar+ ions
• Application of negative bias
to the target to attract the ions
• Ion bombardment of the target and ejection of atoms at the target
Sputtering yield
depends on:
• Energy and angle of incidence of the ion
• Mass of the ion and target atoms
• Binding energy of the surface atom
Challenges of scale
- Suitability for manufacturing in a roll to roll process (related to flexibility of the coating).
- Earth abundancy. Are the materials able to transfer to scale, is there enough mine-able material for that sort of manufacturing level.
- Does the material have a chemical interaction with the steel? It needs to be inert to the steel or have an additional coating for chemical isolation.
- Can it be manufactured at speed or in a continuous process?
- Are the materials sets cheap enough?
- Does the performance translate at scale?
- Ability to handle a rough surface
- Durability and lifetime